Hitachi High-Tech Launches the GT2000, High-Precision Electron Beam Metrology System to Meet the Needs of Semiconductor Devices Development and Mass Production in the High-NA EUV Generation
TOKYO, Dec 12, 2023 - (JCN Newswire via SeaPRwire.com) - Hitachi High-Tech Corporation ("Hitachi High-Tech") announced today the launch of its GT2000 high-precision electron beam metrology system. GT2000 uses Hitachi High-Tech's technology and expertise in CD-SEM(1), where itholds the top market share. GT2000 is equipped with new detection systems to cutting-edge 3D semiconductor devices. It also utilizes low-damage high-speed multi-point measurement functions for High-NA EUV(2) resist wafers imaging to minimize resist damage and improve yield in mass production.GT2000 High-Precision Electron Beam Metrology SystemHitachi High-Tech GT2000 CD-SEM will enable high-precision, high-speed measurements, and inspection in the manufacturing process of advanced semiconductor devices, which are becoming increasingly miniaturized and complex, and contribute to the improvement of customer yields in research-and-development and mass production.Development BackgroundAs semiconductor device manufacturing processes evolve, research-and-development of N2 (2-nanometer generation node) and A14 (14-angstrom generation node) is underway. In addition to the application of High-NA EUV lithography in state...
